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publicationDate 2009-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009145555-A1
titleOfInvention Processing apparatus, exhaust processing process and plasma processing process
abstract There is disclosed an exhaust processing process of a processing apparatus for processing a substrate or a film, which comprises after the processing of the substrate or the film, introducing a non-reacted gas and/or a by-product into a trap means comprising a filament comprised of a high-melting metal material comprising as a main component at least one of tungsten, molybdenum and rhenium; and processing the non-reacted gas and/or the by-product inside the trap means. This makes it possible to prevent lowering in exhaust conductance, to lengthen the maintenance cycle of the processing apparatus, and to provide a high-quality product (processed substrate or film).
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