Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2008-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c25576b64d3d1b547dc48350d90b1a13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a5e27cb33dcee3594a1877478857e98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_617736ba2d8eaeb2820289e96c968f71 |
publicationDate |
2009-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2009111054-A1 |
titleOfInvention |
Negative resist composition and method of forming resist pattern |
abstract |
A negative resist composition including:n a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). nn n n n n n n n n n n n [wherein, R 7 represents a fluorinated alkyl group, and a represents either 0 or 1.] |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8263309-B2 |
priorityDate |
2007-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |