| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_313bf70b56c70e917caa09fd1e962363 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T83-0467
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61B2562-0247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01L9-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22 |
| filingDate |
2007-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a66d9223d5b6abb1fe2f6d9b178bbe8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49cf943a25c199634afb51f7a5c7226c |
| publicationDate |
2009-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009098318-A1 |
| titleOfInvention |
Diaphragm isolation forming through subtractive etching |
| abstract |
Described herein is a housing comprising an inside and at least one sidewall, wherein the at least one sidewall comprises inner and outer surfaces. An etch stop deposit is disposed over at least a portion of the housing, and a diaphragm material deposit is disposed over at least a portion of the etch stop deposit. |
| priorityDate |
2007-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |