| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8381805eba6d034fc77bd230dd02e6e2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-203 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2008-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ffb13393f91f90759e3f6b2bb56c5b67 |
| publicationDate |
2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009068589-A1 |
| titleOfInvention |
Multi-tone resist compositions |
| abstract |
Multi-tone resists can enhance the resolution limit of a lithographic process by advantageously using the changeable solubility of a resist composition as a function of lithographic radiation dosage. By imaging a multi-tone resist with different doses of lithographic radiation in a selected pattern, the pattern can be imparted to the resist upon subsequent development of the resist. In some aspects, a resist composition is utilized having an aliphatic polymer (e.g., a copolymer with fluoropolymer units and/or methacrylate units) with acid labile groups and a plurality of crosslinkable groups that can be crosslinked to other portions of the aliphatic polymer. Other components such as base generators and/or crosslinking agents can also be included. Such compositions can be useful in extending the resolution of UV lithographic radiation processes (e.g., wavelengths less than 200 nm). Other aspects of such compositions and methods are also discussed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013256652-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I459440-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015102837-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011262860-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7829269-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8283111-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013256653-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010273107-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010273099-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010273111-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010068654-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017062622-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013256651-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010126735-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015127459-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8568964-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8574810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11191841-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999622-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017044875-A |
| priorityDate |
2007-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |