http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009056745-A1

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publicationDate 2009-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009056745-A1
titleOfInvention Wet clean process for recovery of anodized chamber parts
abstract A cleaning process for recovering an anodized aluminum part is particularly useful when the part has been exposed to a fluorine-containing plasma in etch reactor. The part is bathed in an agitated solution of a fluoride acid, such as ammonium fluoride, which converts aluminum fluoride to a soluble fluoride. The part is rinsed in water. The pores of the cleaned anodization may be resealed by a submerging the part in hot agitated deionized water.
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