| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a9d67d6c092e4b3d9113078bafdf443b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c19e0a71cede5942ca07a23e5af3bf63
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_159794b4253f63d820c5f8984e170e89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f42ca51da45ef93068c979632019df88 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F05D2230-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-7496
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F05D2300-44 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C99-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C67-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04D29-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04D29-281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04D29-023 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2006-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54b78a3a9c34592a9d7e6814b491b7b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6491df6cb27efb24ac6087cdab49ab29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78df223c1e94a1746690084d3b3152dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_999f793796bf63d2645e0968a69fe9a1 |
| publicationDate |
2009-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009035706-A1 |
| titleOfInvention |
Method for Fabricating Micromachine Component of Resin |
| abstract |
A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap portion defining the circumferential edge potion of the micromachine component and an air gap portion where an internal structure of the micromachine component is constituted to form a multilayer structure, step (c) for depositing dry film resist on the multilayer structure of the cured photosensitive resin composition layer, and performing photolithography of the dry film resist layer to form a cured dry film resist layer in which an air gap portion defining the circumferential edge of a shroud layer and an air gap where the structure of the shroud layer is constituted are formed, and step (d) for separating the micromachine component having the multilayer structure of the cured photosensitive resin composition layer and the cured dry film resist layer from the substrate by removing the sacrifice layer. |
| priorityDate |
2005-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |