| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed89ca88042d3b6f7afc21d7b6dd7b87 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 |
| filingDate |
2008-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bc91a96ada42a2043c991f78147d302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_caccb7ee7b27535d00b899c70b27131a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47ab4963a1daa9f980e1d1ddc141a022 |
| publicationDate |
2009-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009000946-A1 |
| titleOfInvention |
Plasma processing with enhanced charge neutralization and process control |
| abstract |
A plasma processing apparatus includes a platen that supports a substrate for plasma processing. A RF power supply generates a multi-level RF power waveform at an output having at least a first period with a first power level and a second period with a second power level. A RF plasma source having an electrical input that is electrically connected to the output of the RF power supply generates at least a first RF plasma with the first RF power level during the first period and a second RF plasma with the second RF power level during the second period. A bias voltage power supply having an output that is electrically connected to the platen generates a bias voltage waveform that is sufficient to attract ions in the plasma to the substrate for plasma processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010273332-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015206716-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11581170-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009001890-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013287963-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9006065-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9450078-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10410873-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014097487-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8475673-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012145918-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8742373-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016503558-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113543446-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012000421-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011201185-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022260834-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9123509-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021011039-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8926850-B2 |
| priorityDate |
2007-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |