| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6dc2dcfea89c3feb32d542a0ec06f219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f1dd184284e1a35eea7db6b95bcec2d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F15D1-0005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F28F9-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F28F13-12 |
| filingDate |
2008-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d9cd5527438bac600bf5020165e75cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfa92e87816a09ec62c4fb0efc105546 |
| publicationDate |
2008-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008314571-A1 |
| titleOfInvention |
Annular baffle |
| abstract |
A baffle assembly for an etching apparatus is disclosed. The baffle assembly comprises a ring and a lower baffle portion having a curved wall extending between a flange portion and a lower frame portion. A heating assembly may be present within the lower frame portion to control the temperature of the baffle. The baffle assembly may help confine the plasma within the processing space in the chamber. The ring may comprise silicon carbide and the lower baffle portion may comprise aluminum. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8801893-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103874314-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007081294-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8157951-B2 |
| priorityDate |
2007-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |