| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38e037aa2cdf1e7e8bec97e66393f7d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_027a4085da09b06379adbed417e0debb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1c25c92e3646192cd0fb02c27aa604be |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
| filingDate |
2007-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8aa9c9e9cc425b88460c9714eb57b249
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2f39b0b8a5920019591e66dcab0e405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed4752801f8c2ce1635fc5ad535e9cd2 |
| publicationDate |
2008-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008261145-A1 |
| titleOfInvention |
Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride |
| abstract |
New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and preferably phenolic-containing monomers). The photoresist layer comprises a photoacid generator, and is preferably negative-acting. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9402138-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140047552-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101593274-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8445591-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10384934-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9606436-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012130004-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10829368-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9938140-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017052446-A1 |
| priorityDate |
2007-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |