| abstract |
A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The ultrapure water is treated by utilizing a free radical scavenging system and a particulate removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The particulate removal system can comprise one or more ultrafiltration apparatus. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized in feedforward or feedback mode to regulate addition of the precursor compound and the actinic radiation source, and to maintain a temperature of the ultrapure water product. |