Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2008-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80acf29d41c626f58bbf03ec09fe213a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f110e0e7102931afe7edfc0254e94e54 |
publicationDate |
2008-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008241743-A1 |
titleOfInvention |
Positive resist composition and pattern forming method using the same |
abstract |
A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008241749-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I490199-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010233628-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011269071-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8142977-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8808960-B2 |
priorityDate |
2007-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |