| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1150d1d80ff7a4912c50ba531a56d6f2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B2203-0465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B2203-0405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B2203-0495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2111-00801 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B3-503
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2008-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11d12270353b713f76376bfef3a2777d |
| publicationDate |
2008-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008241383-A1 |
| titleOfInvention |
Method for producing hydrogen gas separation material |
| abstract |
The invention provides a method for consistently producing a hydrogen gas separator with a good performance balance. The method includes the process for preparing a porous substrate and the process for forming a silica coat on the substrate by chemical vapor deposition in which a reaction is brought about between a silica source provided to one side of the substrate and an oxygen-containing gas supplied to the other side of the substrate. The vapor deposition process is carried out using as the silica source a silicon compound (a) with Si-Z-Si bonds (Z is O or N) in the molecule. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9828542-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9481781-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9815943-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10167366-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9815952-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011244141-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015057718-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2511005-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10221660-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8512809-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9499677-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3632881-A4 |
| priorityDate |
2007-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |