| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_04ddad32093bb39938c9a4a6a7431bc0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9aac7428bb5035d2aebe81687d8c5aa0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5b772932569ff22b8c1c453b9a4d3d75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2007-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae1a5570161dc0af93ee00b67708c229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0238c54b97f44d20827132fdca8a5f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_752b48ba65a7df5ec86f1d98e1a0ce12 |
| publicationDate |
2008-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008223522-A1 |
| titleOfInvention |
Plasma processing apparatus |
| abstract |
The present invention provides a plasma processing chamber mounted with a function capable of determining the state of a temperature rise in a processing chamber even if a thermometer is not mounted in the processing chamber. In a plasma processing apparatus including: a processing chamber for subjecting a sample to be processed to plasma processing; means for supplying the processing chamber with gas; exhaust means for reducing pressure in the processing chamber; a high-frequency power source for generating plasma; and an electrode on which the sample to be processed is placed, there is provided a plasma emission monitor for determining an end point of temperature raise discharge and means for determining an end point of temperature raise discharge, both of which are used for determining an end point of temperature raise discharge performed before the plasma processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015162227-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11592394-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015145173-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8114244-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10515813-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9271341-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10770262-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012055915-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11443927-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010159704-A1 |
| priorityDate |
2007-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |