| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5de5264d184786b75f35d58402b35df4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3219cbdde3fc01306bad1fd1515ce4cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aed6c2c6bef8acfb939311d98a5bd22e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32125 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-24 |
| filingDate |
2005-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5b121fedc3537a9920d21a2e2c24db3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_237eaac6cc43de507b60b61e437c7938
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4555e1d8529dabc7ecece0d20f2bac8f |
| publicationDate |
2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008217164-A1 |
| titleOfInvention |
Electrolytic Processing Apparatus |
| abstract |
An electrolytic processing apparatus ( 50 ) has feed electrodes ( 74 ) to feed a current to a substrate (W), an ion exchanger ( 76 ) brought into contact with the substrate (W), and process electrodes ( 72 ) to perform an electrolytic process on the substrate (W). The electrolytic processing apparatus ( 50 ) has an electrolytic processing liquid source to supply an electrolytic processing liquid between the substrate (W) and the ion exchanger ( 76 ), and a regeneration liquid supply source to supply a regeneration liquid to a regeneration liquid chambers ( 90 a , 90 b ). The electrolytic processing apparatus ( 50 ) includes regeneration electrodes ( 84 ) spaced from the process electrodes ( 72 ). The feed electrode ( 74 ) has a potential higher than the process electrode ( 72 ) and the same polarity as the process electrode ( 72 ). The process electrode ( 72 ) has a potential higher than the regeneration electrode ( 84 ). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11389887-B2 |
| priorityDate |
2004-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |