Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_082507838ffd3a482218a2d116731fbd |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-68 |
filingDate |
2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_974854cef41cbcf367f33f89a6689c25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72abc180607b1b7b60c2650de55c75da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee8a36bc20041ceea73971ba27650c89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14761f078d91af51de23166579c11788 |
publicationDate |
2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008202037-A1 |
titleOfInvention |
Auto-stopping slurries for chemical-mechanical polishing of topographic dielectric silicon dioxide |
abstract |
The present invention provides auto-stopping CMP slurry compositions that minimize post-CMP non-uniformity and also extend the time that polishing can be continued beyond the end point without the risk of over-polishing the dielectric silicon dioxide film. Auto-stopping CMP slurry compositions according to the invention include ceria abrasive particles and an effective amount of a polyalkylamine such as polyethyleneimine dispersed in water. The methods of the invention include polishing a topographic dielectric silicon dioxide film layer using the auto-stopping CMP slurry compositions to obtain a dielectric silicon dioxide surface having a desired predetermined minimum step height. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022133789-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112740375-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021121043-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113004797-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11462415-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010301014-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10144849-B2 |
priorityDate |
2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |