| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5bbd7cee0b5ed080e0f23151de86e4f2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_190a182400de529ab9b9620166e87d27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb740ed7ced03b46dceb5ad6b719294a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 |
| filingDate |
2006-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c3f7bbea489478c2d3673d627a838cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fce7e00134e0154c7eaea21e88254724
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f379ce91768ca132ae50db6b15775650 |
| publicationDate |
2008-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008190894-A1 |
| titleOfInvention |
Chemical Mechanical Polishing Slurries, Their Applications and Method of Use Thereof |
| abstract |
This invention disclosed a chemical mechanical polishing slurry, which includes at least one abrasive particle, an oxidant and a carrier. The oxidant is combined with a big metallorganic compound; and the applications and corresponding handling method are also disclosed. This invention slurry can realize high removal rate, no corrosion, low defectivity and high plan |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10510601-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11114339-B2 |
| priorityDate |
2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |