http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008176148-A1

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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d9f29072db6621ab596b0bcc58754cf
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publicationDate 2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008176148-A1
titleOfInvention Method of making a grayscale reticle using step-over lithography for shaping microlenses
abstract A method of fabricating a grayscale reticle includes preparing a quartz wafer substrate; depositing a layer of SRO on the top surface of the quartz substrate; patterning and etching the SRO to form an initial microlens pattern using step-over lithography; patterning and etching the SRO to form a recessed pattern in the SRO; depositing an opaque film on the SRO; patterning and etching the opaque film; depositing and planarizing a planarizing layer; cutting the quartz wafer into rectangular pieces sized to be smaller than a selected blank reticle; bonding the a piece a to selected reticle blank to form a grayscale reticle; and using the grayscale reticle to form a microlens array on a photoimager.
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Total number of triples: 30.