| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268d49ea429a3f0ef113711f7285a43f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3def0e4b3f4e2be2f436ea8318f9505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9019a48e71659d6b2e1fcc1cbde61a8e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4aecd14ddae22a6cc40270a1e6101d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7e62f4a5b7977f61e982b8f8d959770c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49826 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3491
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3426 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23P11-00 |
| filingDate |
2007-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7682abdcc51ab0b113c756402f87f5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c60d4c2bf9963709c32a54d80f0a0b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3de0fb0ad9e80fb9e2cce6bec87997bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccbbf4b04fc9cca28fa009db80cb667d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a15eeb37bd12195017253ceab53d6786 |
| publicationDate |
2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008173541-A1 |
| titleOfInvention |
Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling |
| abstract |
A sputtering target is described herein that comprises: a) a target surface component comprising a target material; b) a core backing component having a coupling surface and a back surface, wherein the coupling surface is coupled to the target surface component; and c) at least one surface area feature coupled to or located in the back surface of the core backing component, wherein the surface area feature increases the resistance, resistivity or a combination thereof of the core backing component. Methods of forming a sputtering target are also described that comprises: a) providing a target surface component comprising a surface material; b) providing a core backing component comprising a backing material and having a coupling surface and a back surface; c) providing at least one surface area feature coupled to or located in the back surface of the core backing component, wherein the surface area feature increases the resistance, resistivity or a combination thereof of the core backing component; and d) coupling the surface target material to the coupling surface of the core backing material. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I796607-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D966357-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10861683-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D940765-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D946638-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011031109-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D908645-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10060024-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D902165-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9752228-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D894137-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8398833-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D970566-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-D868124-S
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017250061-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010252416-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019035612-A1 |
| priorityDate |
2007-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |