Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f1f911ad420a98a4784a949cb27c01ce |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-26 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-1224 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-355 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-364 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0665 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0648 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C35-08 |
filingDate |
2007-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9210b33efe6e7d402d960fe4809d25dc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c39b509aefb6c3a2c942c96734aec6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13d190f9af60de0b4a15c1ce969793e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee361ea9a904493dcc314e8dc5dc799f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_071158fed5bb86ac370c85c9bdf3a027 |
publicationDate |
2008-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008160295-A1 |
titleOfInvention |
Method for adjusting ablation threshold |
abstract |
The invention pertains to a method for lowering the ablation threshold of a laser-ablated material by having on a surface of the laser-ablated material a structuring which reduces the reflection of a laser beam. The ablation threshold can be further lowered by heating the material as well as by chemically modifying the material or its surface, even slightly. The invention facilitates industrial implementation of machining of a number of various surfaces and materials. The invention also pertains to target materials to be ablated. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014332435-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10639741-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102966917-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016272822-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2897760-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010175854-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9278374-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8987632-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011086204-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11235359-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I611856-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3769900-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107862736-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104002483-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3013516-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106780187-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9962788-B2 |
priorityDate |
2006-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |