| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da3b6ec3e3e092be5a8d375f17a6423b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-26 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-009 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-50 |
| filingDate |
2008-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a51dcedb9eacb28a0d0a53187d070af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_411fb9446e279edfa7613fbe16abf311 |
| publicationDate |
2008-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008131689-A1 |
| titleOfInvention |
Ceramic article having corrosion-resistant layer, semiconductor processing apparatus incorporating same, and method for forming same |
| abstract |
An article is provided that includes a substrate and a corrosion-resistant coating provided on the substrate. The substrate generally consists essentially of alumina, and the corrosion-resistant coating is provided so as to directly contact the substrate without the provision of intervening layers between the substrate and the corrosion-resistant coating, such as reaction products provided by high-temperature treatment processes. The corrosion-resistant coating generally consists essentially of a rare earth oxide, and has an adhesion strength not less than about 15 MPa. According to particular embodiments, the article is a ceramic component utilized and implemented in a semiconductor processing apparatus for processing semiconductor wafers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7666319-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10544500-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10563297-B2 |
| priorityDate |
2003-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |