| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate |
2007-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d7422e268f9bffa99f0f8ee91bfe94f |
| publicationDate |
2008-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008111102-A1 |
| titleOfInvention |
Chemical Mechanical Polishing Slurry |
| abstract |
A polishing slurry for a chemical mechanical polishing. The polishing slurry includes an aqueous medium. A fluorinated nanodiamond is provided to be contained in the aqueous medium. Additionally, a fluorine-based surfactant is provided also to be contained in the aqueous medium. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011124541-A1 |
| priorityDate |
2006-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |