abstract |
Ruthenium containing precursors for ruthenium containing films deposition comprising a ruthenium precursor selected from the group essentially consisting of Ru(XOp)(XCp), Ru(XOp) 2 , Ru(allyl) 3 , RuX(allyl) 2 , RuX 2 (allyl) 2 , Ru(CO) x (amidinate) y , Ru(diketonate) 2 X 2 Ru(diketonate) 2 (amidinate) 2 , their derivatives, and any mixture thereof. |