http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008084649-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01T23-00
filingDate 2006-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3e76d5edac0857f7b757ba389518d61
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publicationDate 2008-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008084649-A1
titleOfInvention Apparatus and method to improve uniformity and reduce local effect of process chamber
abstract An apparatus includes a processing chamber having a plasma containing region, a dielectric plate secured on top of the processing chamber, a power source separated from the plasma containing region by the dielectric plate, and a chuck supported within the processing chamber. The chuck is operable and configured to move with respect to the power source.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11155922-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013087097-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102270168-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102287835-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180118693-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013206594-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9330887-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190049950-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11251068-B2
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Total number of triples: 30.