| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95615 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-4788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-95607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-24 |
| filingDate |
2006-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca49d284e69f9416be63854e0d8e985f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d215910a0009cd115b34c8d6f73f47f4 |
| publicationDate |
2008-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008074677-A1 |
| titleOfInvention |
accuracy of optical metrology measurements |
| abstract |
The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8798966-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009179307-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010030545-A1 |
| priorityDate |
2006-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |