Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e52e7ad9df6ef99419f4da0ed11ee7f4 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-40 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14 |
filingDate |
2006-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6e64e4bc0bffb89e4d2e0e4b5b4b5cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7bed90cee68da2269f987a942bdde03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff4998bdccf577f800cf3e0e1ebb53fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99bc0dc91c688f41d3200299f2e3bda6 |
publicationDate |
2008-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008069953-A1 |
titleOfInvention |
Inlet system for an MOCVD reactor |
abstract |
The invention relates to a device for depositing especially crystalline layers on at least one especially crystalline substrate in a process chamber comprising a top and a vertically opposing heated bottom for receiving the substrates. A gas-admittance body forming vertically superimposed gas-admittance regions is used to separately introduce at least one first and one second gaseous starting material, said starting materials flowing through the process chamber with a carrier gas in the horizontal direction. The gas flow homogenises in an admittance region directly adjacent to the gas-admittance body, and the starting materials are at least partially decomposed, forming decomposition products which are deposited on the substrates in a growth region adjacent to the admittance region, under continuous depletion of the gas flow. An additional gas-admittance region of the gas-admittance body is essential for one of the two starting materials, in order to reduce the horizontal extension of the admittance region. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11534790-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8778079-B2 |
priorityDate |
2004-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |