| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49204
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-151
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49117
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-03 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-1474
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate |
2007-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c128366f8a2cb02ecea5a7d1bc55fd45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fa978125a0a4153a3c6ed7737853d43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6e643747365a62fbac57d4ec4acb138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1c7a03cc8169cd9ac88cdaf9eef2524 |
| publicationDate |
2008-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008067429-A1 |
| titleOfInvention |
Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate |
| abstract |
A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7550739-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013307521-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9202734-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009247060-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007228275-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015249030-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7867060-B2 |
| priorityDate |
2006-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |