| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00 |
| filingDate |
2007-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eee565e0921f3f7c3d4efebf21724b53 |
| publicationDate |
2008-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008063976-A1 |
| titleOfInvention |
Photoresist Composition and Method Of Forming A Resist Pattern |
| abstract |
A resist material utilized in photolithography patterning includes a first material, and a second material dispersed in the first material. The second material is capable of diffusing to a top surface of the resist material, and has an etch rate different from that of the first material. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10177001-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9030617-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016172737-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101641957-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9698014-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100058046-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014085557-A1 |
| priorityDate |
2006-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |