| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a07d8f1d25591a80fd38586a16991ad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5a64b7377d512d001d197da84c6c86be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_328f3d71bb9ebd0d27677d5f7a93fa78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da92c1b66845e9cc87b0b4180561d565 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-0447
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-0415 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00111 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-304 |
| filingDate |
2005-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c79e42a67a82f79ac447f20402678cc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03e4fca64f8a3fcf8a47e6be5150a7ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3320598ca249d3a185d4f45248c128f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f26e07aee196c11bcbecf1aaa4da5214 |
| publicationDate |
2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008044647-A1 |
| titleOfInvention |
Method for Forming Carbonaceous Material Protrusion and Carbonaceous Material Protrusion |
| abstract |
This method of forming a carbonaceous material projection structure includes: the step of applying a resist 11 onto a diamond substrate 10 ; the step of forming holes 12 in the applied resist 11 , the holes 12 being provided according to a predetermined arrangement, a wall 12 b of each of the holes 12 being inversely tapered from an aperture 12 a toward a bottom; the step of depositing a mask material through the aperture 12 a to form a mask deposition 14 in each of the holes 12 ; the step of lifting off a mask material 13 deposited on the resist 11 together with the resist 11 ; and etching the diamond substrate 10 using the mask deposition 14 as a mask to form a carbonaceous material projection. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8158011-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010293675-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10263114-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10249764-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010093171-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010032708-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8104332-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009038382-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8344379-B2 |
| priorityDate |
2004-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |