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filingDate 2007-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2008-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008038542-A1
titleOfInvention Method for high resolution patterning using soft X-ray, process for preparing nano device using the method
abstract A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substitutents at its terminal rings on a substrate, selectively cleaving bonds to the substituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.
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