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publicationDate 2008-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008032432-A1
titleOfInvention Composition for stripping photoresist and method for manufacturing thin transistor array panel using the same
abstract The present invention provides a photoresist stripper including about 5 wt % to about 20 wt % alcohol amine, about 40 wt % to about 70 wt % glycol ether, about 20 wt % to about 40 wt % N-methyl pyrrolidone, and about 0.2 wt % to about 6 wt % chelating agent.
priorityDate 2004-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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