Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
filingDate |
2007-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0da5708bb45d88b87a655a2817fdc610 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f51625f4f9ce60788d5bc1ec28112c46 |
publicationDate |
2008-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008032232-A1 |
titleOfInvention |
Novel resins and photoresist compositions comprising same |
abstract |
Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise a deblocking resin that contains hydroxy naphthyl units and can be effectively imaged with sub-200 nm radiation such as 193 nm radiation. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010159404-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8507173-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8003295-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009087786-A1 |
priorityDate |
2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |