| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_253e4a8c944f2a01fc4f3313d0d3c056
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_537e2fe7ff4e9f6497c4a40fc57219ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8b949d36e384a60b90a68842403861fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_edd09e3cc4188eb45edff4a960471226 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-2247 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-2205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-22 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-00 |
| filingDate |
2006-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1446e22f69f2ebb34a202d3acb6aefd1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0403041e92377aa2cbf63d9f80b8b437
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9470829ea47685ea9b8eafc20c27661
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e7ab23c8081ca7352a7f427c05212f6 |
| publicationDate |
2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008009099-A1 |
| titleOfInvention |
System and method of monitoring contamination |
| abstract |
The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9182314-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8706325-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8592222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9146112-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9322657-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8990033-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11784031-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8788222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022256295-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2937141-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010040817-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013030724-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9207089-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8731807-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011217789-A1 |
| priorityDate |
2001-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |