http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008003727-A1

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1255
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filingDate 2007-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83a635e97e26d5017dc4c4b8a17c1dc9
publicationDate 2008-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008003727-A1
titleOfInvention Method of manufacturing semiconductor device
abstract A method of manufacturing a thin TFT over a flexible substrate is provided. In formation of a TFT on a surface of a substrate having heat resistance, a liquid repellent film is formed selectively on a surface of the substrate, and an organic film is formed thereover. An element such as a TFT is formed over the organic film. Since the liquid repellent film is formed over the substrate, adhesion between the substrate and the organic film is low; therefore, the element which is formed can be peeled off from the substrate easily. Further, since the element is not transferred to another substrate, a semiconductor device which is thinner than conventional ones can be manufactured. In order to form the liquid repellent film selectively, light exposure of a front surface or a back surface of the substrate provided with a mask, a droplet discharging method, or the like is used.
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