| abstract |
A chemical mechanical polishing composition includes: an abrasive component, a corrosion inhibitor, a surfactant, a diacid compound, a metal residue inhibitor, and water. The metal residue inhibitor is selected from the group of compounds having the following formulas: n nand combinations thereof, n wherein R 1 , R 2 , R 3 , and R 4 are independently selected from H, C 1 -C 6 alkyl, C 2 -C 6 alkenyl, and C 2 -C 6 alkylidyne; and R 5 , R 6 , R 7 , R 8 , R 9 , and R 10 are independently selected from H and C 1 -C 6 alkyl. |