http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007231752-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8f063b8222ec3c8e746a415e7f364473 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2006-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0238360055877bb5830a0b3f65f79c07 |
| publicationDate | 2007-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2007231752-A1 |
| titleOfInvention | Method for Shrinking Opening Sizes of a Photoresist Pattern |
| abstract | A method for shrinking opening sizes of a photoresist is provided. A patterned photoresist layer having an opening is formed on a substrate. The opening includes a first size. The photoresist layer is baked at a temperature below a glass transition temperature of the photoresist layer. A layer of SAFIER material is formed on the photoresist layer and the substrate. The layer of SAFIER material and the photoresist layer are baked at a temperature higher than the glass transition temperature to shrink the size of the opening. The layer of SAFIER material is removed. The first size of the opening is thus shrunk to a second size. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102540773-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8389402-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103293848-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103309151-A |
| priorityDate | 2006-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.