| abstract |
Adherence between antireflective coating and a carbon containing hard mask may be improved by treating the carbon containing hard mask with a plasma. In some embodiments, using antireflective coatings, such as silicon dioxide, SiO x H y , SiO x N y , or organics, adherence to carbon containing hard masks may be improved by exposing the hard masks to a plasma treatment. In some embodiments, the plasma treatment creates a buffer layer with improved adherence to the antireflective coating. |