| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba05ac5cea9876f891a27e28f6afc6c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c0397e4774e4a52dd60b06e7d76a405 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2024 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C25-68 |
| filingDate |
2007-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78d5ac2f79fada1d54c81cc0f421a88d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f045a11a0398a777aa0f6c6cb521794 |
| publicationDate |
2007-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007228004-A1 |
| titleOfInvention |
Device and method for the treatment of wafers |
| abstract |
A device and a method is provided for irradiating wafers with low-intensity UV light to prevent blistering during the subsequent photostabilization of the photoresist. |
| priorityDate |
2006-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |