| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76224 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate |
2007-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042752706dba7db0203a720ae9ac85a9 |
| publicationDate |
2007-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007178663-A1 |
| titleOfInvention |
Methods of forming a trench having side surfaces including a uniform slope |
| abstract |
Provided herein are methods of forming a trench including forming a mask layer on a substrate, forming a mask pattern to expose the substrate, using plasma to at least partially remove by-products produced during formation of the mask pattern; and etching the exposed substrate to form a trench having side surfaces including a uniform slope. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8105950-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106783583-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008261360-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008230516-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7767512-B2 |
| priorityDate |
2006-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |