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publicationDate 2007-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2007167110-A1
titleOfInvention Multi-zone carrier head for chemical mechanical polishing and cmp method thereof
abstract A multi-zone carrier head includes a housing; a retaining ring secured to a lower edge of the housing; a backing plate having a plurality of non-concentric pressure zones defined by a plurality of isolated apertures on the backing plate; wherein the backing plate has a wafer side and a non-wafer side, the wafer side facing a backside of a wafer during a CMP operation; and a plurality of pneumatic bladder for independently controlling pressure exerted in the respective non-concentric pressure zones on the backside of the wafer during the CMP operation.
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priorityDate 2006-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 48.