Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49a86257f3362e2a4bd7d6260bd24813 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_30890fa0f8124a6527475b4a830c0b8f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f066163439a8e3eef4b75fe9f36cf983 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d25d465091318dd782318d538882e58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4b9909875ba985557e5e7f6123e54705 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2325-26 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D67-0072 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D71-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31695 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C65-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-00 |
filingDate |
2006-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_490494ccfff79de2b85e275d8d043f36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a71f87ced2d045f4be7794fe5e77e812 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ca2ed4a2c939f9058e67b5d06de2b5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b67e93a96641138808d7cfe7c67075ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dc2acd5f78ea67ee31de890a3ed9125 |
publicationDate |
2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2007158013-A1 |
titleOfInvention |
Method for forming porous insulation film |
abstract |
A method of forming a porous film on a semiconductor substrate includes: supplying a silicon compound containing at least one Si—O bond in its molecule in a gaseous phase into a reaction chamber; forming a siloxane oligomer through plasma reaction of the silicon compound; and supplying an organic amine in a gaseous phase into the reaction chamber and reacting the organic amine with the siloxane oligomer, thereby forming a porous film on the semiconductor substrate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7601402-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101137756-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2493090-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2493090-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004212114-A1 |
priorityDate |
2005-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |