Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate |
2006-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_844eba9ddb0ab8e958bdcf0e5a580cfa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40f1b885ac1e2104415d691f87f7e816 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7332926b40c3c78a748abec726729e7e |
publicationDate |
2007-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2007122752-A1 |
titleOfInvention |
Semiconductor device manufacturing method and substrate processing system |
abstract |
A semiconductor device manufacturing method includes: forming an etching mask having a predetermined circuit pattern on a surface of an etching target film disposed on a semiconductor substrate; etching the etching target film through the etching mask to form a groove or hole in the etching target film; removing the etching mask by a process including at least a process using an ozone-containing gas; and recovering damage of the etching target film caused before or in said removing the etching mask, while supplying a predetermined recovery gas. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017178758-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009029558-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009061633-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8012880-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8324116-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11018017-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015034245-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015020967-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109661717-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022262622-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2023207315-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8404584-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10961623-B2 |
priorityDate |
2005-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |