| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C71-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
| filingDate |
2007-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cca05a8058dcc64fe4e3e1a085168a9 |
| publicationDate |
2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007117876-A1 |
| titleOfInvention |
Photosensitive resin composition for black matrix |
| abstract |
A photosensitive resin composition for a black matrix comprises (A) an alkali-soluble resin; (B) a photopolymerizable monomer; (C) a photoinitiator; (D) a solvent; and (E) a black pigment; wherein the alkali-soluble resin (A) comprises a functional group having a general formula (a-1); viscosity of said photosensitive resin composition for the black matrix is 0.5-4.0cps at 25° C.; the solid content of said photosensitive resin composition is 5-17.5 wt. %; and said solvent (D) has a saturated vapor pressure below 4.5 mmHg at 20° C.; which presents no pinhole on the surface after low pressure drying, no line and cloud defect on the film, good inner uniformity of the coated film and high photosensitivity after pre-bake, high heat resistance for black matrix after post-bake, especially no poor coating on substrates of LCD by the slit coating. n n(Each of R is independently H, linear or branch alkyl of C1-C5, phenyl or halogen.) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10233269-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102200688-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016046552-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9902675-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9914687-B2 |
| priorityDate |
2004-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |