| abstract |
A method of forming the alignment film includes placing an inorganic target and a substrate in a chamber so that the inorganic target and the substrate are parallel to each other, evacuating the chamber to a first pressure, supplying a discharge gas into the chamber and evacuating the chamber to a second pressure higher than the first pressure. Moreover, the method further includes depositing an inorganic film on the substrate by ejecting inorganic particles from the inorganic target. |