| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_733afd3238c015eb2a001ad663072fb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e09d2ad6e2e9a379fcd9718253bdfb42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_50dd9258884ae38ec4991cadb8832397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98b05280958dbc47c66f778ac35767fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f254be6b1ac62d257818a7b934dd432d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e155ccb7db9b7242d654419000e9d503
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c0121ee565c05bea63d6bf30d18a763a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2553-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2323-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2323-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2323-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31938
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31909
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-264
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 |
| filingDate |
2004-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c052ca4c735e0b0e93e4e362d08107c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec35e5c82f0227de2205b25e2489a4e9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebdf38e919cdd7be75d4abda3b77f784
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae0c6052a941cfd2ab6384f3b5755628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d33d1b4bf55e440ebf3c3a43c7711766
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afab369656feeed58ba2d80bc2a0fcf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b821286fe3373bf68baf3661a4d8a88b |
| publicationDate |
2007-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007082191-A1 |
| titleOfInvention |
Films with superior impact resistance and improved catastrophic failure resistance under high strain rate |
| abstract |
Stretch films which exhibit good puncture and impact resistance while also exhibiting resistance to defect propagation are desired. The films of the present invention have an ultimate stretch of at least 200 percent, a dart impact strength of at least about 700 gms/mil and a catastrophic failure stretch of at least 95 percent of the elongation to break value (CF of 5 or less). The films preferably comprise at least 3 layers and preferably comprise at least 50 percent by weight of polyethylene polymers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018147821-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7951873-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9765164-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10507632-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10508369-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007260016-A1 |
| priorityDate |
2003-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |