| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8233792a15cd19fc671cdfdaa1200087 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24917
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24926 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-949
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-02 |
| filingDate |
2004-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bdfdaad727e12e7d563c30375a350f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15a39805251c7df7d1c4ff23c284816c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c62a527f89db0a657f1533adcc5e275 |
| publicationDate |
2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007059501-A1 |
| titleOfInvention |
Tantalum carbide, method for producing tantalum carbide, tantalum carbide wiring and tantalum carbide electrode |
| abstract |
It is an object of the present invention to provide a method for manufacturing tantalum carbide which can form tantalum carbide having a prescribed shape using a simple method, can form the tantalum carbide having a uniform thickness even when the tantalum carbide is coated on the surface of an article and is not peeled off by a thermal history, tantalum carbide obtained by the manufacturing method, wiring of tantalum carbide, and electrodes of tantalum carbide. n The tantalum carbide is formed on the surface of tantalum or a tantalum alloy by placing the tantalum or tantalum alloy in a vacuum heat treatment furnace, heat-treating the tantalum or tantalum alloy under a condition where a native oxide layer of Ta 2 O 5 formed on the surface of tantalum or tantalum alloy is sublimated to remove the Ta 2 0 5 , introducing a carbon source into the vacuum heat treatment furnace, and then heat-treating. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012067462-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8986466-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10287667-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009093739-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2439308-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8685874-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9435018-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017199092-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112159952-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10048142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11027977-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9322113-B2 |
| priorityDate |
2003-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |