http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007037096-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C225-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F210-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C225-22 |
| filingDate | 2006-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_556b020014493f2742249b946ab81bfb |
| publicationDate | 2007-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2007037096-A1 |
| titleOfInvention | Photo radical generator, photo sensitive resin composition and article |
| abstract | The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an article using the radical generator. The photoradical generator provided according to the invention contains a compound (a) having one or more self-cleavage type radical-generating parts and one or more ethylenic unsaturated groups in one molecule. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9036119-B2 |
| priorityDate | 2003-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 390.