Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_21c67c4d802dbc813f5601d7c2115c58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d9fb9705c4dfbcf334ae2b5c9a2f1d6 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-02 |
filingDate |
2006-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d3dea349e8d93dcc354909c2de3ce5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ae950ec7d01f22418fe89e35d4b371b |
publicationDate |
2007-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2007021040-A1 |
titleOfInvention |
Polishing composition and polishing method |
abstract |
A first polishing composition includes abrasive grains and an iodine compound and has a pH of 6 or more. The first polishing composition can suitably polish the Si [0001] plane of a single crystal silicon carbide substrate. A second polishing composition includes an iodine compound and has a pH of 8 or less. The second polishing composition can suitably polish the C [000-1] plane of a single crystal silicon carbide substrate. A third polishing composition includes abrasive grains and an iodine compound and has a pH of 6 to 8, inclusive. The third polishing composition can suitably polish each of the Si [0001] and C [000-1] planes of a single crystal silicon carbide substrate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9662763-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009111001-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110317540-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010084343-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10759981-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101302403-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9085714-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11015098-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017321098-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8647527-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019190738-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9388328-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011156058-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015052822-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2679342-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2679342-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9129901-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008173843-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11279850-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105579548-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011183113-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014094032-A1 |
priorityDate |
2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |