| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dd467702ade456525b7168b3e349ae53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44a0db0425108721b4b5ad53d08ba3db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_713063d61d0dd532a610bcd078ea836b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81d0184cb2b72d5d299473f0af99ef3b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-461 |
| filingDate |
2005-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfe8dd7d14cfc94246ec4c7c3d4f7ae2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03351188af82a567f7440ac840460c44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4710257e2c7293af41d85d51f86c9b1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e1ec5203e46ccc00d681dda014df3b1 |
| publicationDate |
2007-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007012662-A1 |
| titleOfInvention |
Solution for wet treatment of hafnium containing materials, use of the solution and a wet treatment process |
| abstract |
It is one object to devise a solution which is suitable for a wet treatment of Hafnium containing high-k materials. Furthermore, it is an object to devise a use of this solution in the field of semiconductor device manufacturing. It is also an objective of the invention to devise a process to this aim. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014179082-A1 |
| priorityDate |
2005-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |