| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e332e80cb474e447b48a75cea8638f7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-34 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-38214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-50 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-153
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40 |
| filingDate |
2006-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45414dbf587390d24f98377f2fef7292
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65ca54d13300dc4674ceb2025d3edf54 |
| publicationDate |
2007-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007009827-A1 |
| titleOfInvention |
Lamination and delamination technique for thin film processing |
| abstract |
This invention discloses a releasable adhesion layer having good adhesion during high temperature fabrication process in the absence of light, and delaminating at a lower temperature in the presence of light. One embodiment of this invention is a film of polymer whose thermal decomposition temperature changes drastically upon photoexposure. These materials, prior to photoexposure, can withstand temperatures in the range of approximately 200° C. to 300° C. without decomposition, yet decompose at around 100° C. with photoexposure. The releasable adhesion layer can be used in a thermal transfer element, sandwiching a donor substrate and a transfer layer having a plurality of multicomponent transfer units. In the absence of light, the releasable adhesion layer can sustain high temperature processing of these multicomponent transfer units. By photoexposing according to a pattern, the photoexposed multicomponent transfer units can be selectively released at a low temperature to transfer to a receptor. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9184180-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010295028-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8969127-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9735379-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8039838-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009191670-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009189204-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977173-B2 |
| priorityDate |
2003-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |