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publicationDate 2006-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2006275931-A1
titleOfInvention Technology of detecting abnormal operation of plasma process
abstract A method of detecting abnormal operation of a plasma process, includes: (i) detecting a potential Vpp 1 between an upper electrode and a lower electrode disposed parallel to each other in a reaction camber at a time T 1 after the plasma process begins in the reaction chamber; (ii) detecting a Vpp 2 between the upper electrode and the lower electrode at a time T 2 after T 1 ; (iii) comparing Vpp 1 and Vpp 2 to obtain an operation value; and (iv) determining abnormal operation if the operation value is within a predetermined range.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7632549-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11355324-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8082124-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009068852-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10043690-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010161278-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016293385-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010104770-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009274851-A1
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Total number of triples: 28.